Overview of KRC-NTC-HfO2
The Nano Thickness Calibrators (NTC) for the thickness measurement of nm oxide films are CRMs for the calibration of thickness measurement equipment, such as, XRR, XPS, Ellipsometry, TEM, MEIS, etc..
The KRC-NTC-HfO2 [HfO2(5-25 nm)/SiO2(2 nm)/Si(100)] is composed of 5 thin HfO2 films grown by atomic layer deposition on Si(100) wafers with a surface SiO2 layer of about 2 nm, grown by thermal oxidation.
They can be used to calibrate the parameters for the thickness measurement of nm HfO2 films through certified values.
Specifications of KRC-NTC-HfO2
| Item | Detailed Specifications |
| Nominal thickness | 5, 10, 15, 20, 25 nm |
| Substrate | SiO2(2 nm) / Si(100) wafer |
| Film deposition | Atomic Layer Deposition |
| Certification method | Mutual calibration with TEM and MEIS |
| Traceability | Silicon lattice constant measured by TEM |
MEIS Spectrum
